Multi-wavelength
Ellipsometers measure thin film thickness and other properties.
Film Sense offers multi-wavelength ellipsometers for measuring thin films, including instruments for in situ process monitoring and automated mapping. The compact systems use long-life LEDs and a detector with no moving parts. Measurements can determine the thickness of many transparent films from 0 to 5,000 nm in about one second, and can also measure optical constants and other film properties for many samples. Applications include research labs, classrooms, in situ process control, and industrial quality control. Product offerings include the FS-1 family, an in situ system for ALD and ALE processes, automated thickness uniformity mapping, and data analysis software. Instruments are offered for measurements on wafers up to 300 mm.
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Ellipsometers measure thin film thickness and other properties.
Characterize ALD and ALE processes in real time.
Create thickness uniformity maps on wafers up to 300 mm.
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